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List of KIMM TechnologiesNano-convergence Manufacturing Research Division

Transparent Electrode and Transparent Electrode Film Manufacturing Technology

Division Nano-Convergence Manufacturing Systems Research Division > Department of Flexible & Printed Electronics
Name Dr. Jeongdai Jo
Department Department of Printed Electronics
Tel +82 - 42 - 868 – 7162
E-mail micro@kimm.re.kr
Attachment Download 027_Transparent_Electrode_and_Transparent_Electrode_Film_Manufacturing_Technology.pdf (5.3 KB)

Technology to easily fill metal ink/paste into the pattern grooves imprinted on a flexible/elastic plate to simplify transparent electrode film making process

 

Client / Market

  • Touch panel next generation display, optical film, security film, bio sensor, microlens, membrane plate, 3D sensor, energy device and wave absorber, etc.

 

Necessity of this Technology

  • Generally, a micro pattern is formed on a flexible/elastic material, and metal ink/ paste is filled inside the micro pattern to create a transparent conductive film.
  • For example, a micro pattern of concave grooves is created on a synthetic resin film, and the grooves are filled with metal ink/paste to form a transparent electrode.
  • The process of creating transparent electrode becomes complex as the grooves are filled with metal paste using a blade, and overflowing paste is removed-blading process and cleaning process are added.
  • For a large area, the conductive ink needs to be spread throughout the entire area-a great ink consumption.
  • Difficult to spread the ink evenly with a blade on a large area
  • After inking, the areas outside the pattern needs to be cleaned-additional process requiring a long time.
  • Difficult to realize various patterns

 

Technical Differentiation

  • Conductive ink is only filled inside the pattern-less ink consumption
  • Without the blading and cleaning process, the number of process is reduced.
  • Inking is easy and does not require separate inking device and cleaning device.
  • Using laser, various patterns can be created-shortened pattern mask making time.
  • There is no film damage from patterning, therefore various types of films can be used.
  • Able to create sub-micrometer (500 nm) pattern (below 5 μm), which was difficult with existing roll printing
  • 5 μm (line width, spacing, shape) carving plate design and production: Designed considering the ink spreading property and conductivity and penetrance property after device production (Pattern size: 500 nm, 1, 5, 10, 20, 30 μm Pattern spacing: 100, 200, 300, 400, 500 μm, 1 mm, 2 mm)

 

Excellence of Technology

  • No limits regarding materials to be used as various types of flexible (PET, PEN, PC, etc.) and elastic materials can be used.
  • After plasma treatment of the film surface to create (super) hydrophobic surface with the contact angle over 100 degrees, laser or roll imprint is processed to create patterns.
  • Conductive ink on film surface/Drop paste inside the concave pattern groove to form a micro pattern and immediately dry/Harden

 

Current Intellectual Property Right Status

PATENT
  • Transparent Conductive Film Manufacturing Method, Device and the Transparent Film (KR1357284, EP14168884.6)
  • Transparent Electrode Manufacturing Method Using Metal Pattern Based Print and Transparent Electrode Thereby (KR1659462)
  • Transparent Electrode Manufacturing Apparatus Using Metal Grid Based Printing (US13/223365)

 

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