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List of KIMM TechnologiesEco-friendly Energy & Environment Research Division

Remote Plasma Generator

Division Eco-friendly Energy & Environment Research Division > Department of Plasma Engineering
Name Dr. Wooseok Kang
Department Department of Plasma Engineering
Tel +82 - 42 - 868 - 7435
E-mail kang@kimm.re.kr
Attachment Download 128_Remote_Plasma_Generator.pdf (0.4 KB)

Plasma generator that enables effective processing by reducing damages on a material in a wide range of pressure variations

 


 

Client / Market

  • Semiconductor/display equipment company
  • Material/bio/agriculture/environmental application equipment manufacturer using plasma processing

 

Necessity of this Technology

  • Existing remote plasma generators rely on the radio frequency (RF) or microwave (MW) power supplies that require matching technology between the plasma reactor and the power. Matching is venerable to load change, and is difficult to operate under high pressure.
  • In particular, matching technology may limit high-power ICP for large capacity/area treatments.

 

Technical Differentiation

  • Enables process that minimizes material damage
  • Can be applied extensively as a new applied technology in flexible device/display and bio fields
  • Can be applied for various operating areas
  • Effective process by controlling the plasma characteristics
  • Neutral particle and low energy ion treatment: Effective plasma chemical process/ minimal damage to the vulnerable objects
  • Can be operated under a broad pressure range due to the capacitively coupled effect of the dielectric substance
  • Wide operation ranges-less dependent to the operation pressure change
  • Easy flow velocity/reaction effect/uniformity control with the nozzle type design
  • Can be operated under high power conditions/large-volume (or surface) treatment

 

Excellence of Technology

  • The capacitively coupled type does not require a special matching technology, and depending on the size of dielectric substance support, large capacity and large area plasma treatment can be conducted easily.
  • The operating range is wide from few mTorr to few Torr, and depending on the slope angle of the slope on the nozzle part, the electric field and flow velocity change rate can be adjusted to easily control the process parameters.

 


 

Current Intellectual Property Right Status

PATENT
  • Apparatus for Generating Remote Plasma (KR2013-0073901, EP14153996.5)
  • Apparatus for Generating Capacitively Coupled Plasma (KR2013-0054469)

 


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